29 July 2002 Optical systems for melt level measurement in the process of crystal growth
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Proceedings Volume 4900, Seventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life; (2002) https://doi.org/10.1117/12.484616
Event: Seventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life, 2002, Novosibirsk, Russian Federation
Abstract
Two approaches to measurement of melt level in crucible are analyzed: the traditional one based on the use of laser triangulation sensor and the proposed method based on the use of noncoherent passive binocular sensor permitting to measure simultaneously both the melt level and the diameter of the crystal during the crystal growth. The limitations of these approaches are analysed. Estimates of metrological characteristics (systematic measurement errors and effective range) depending on the level of melt, its angular velocity and the distance of measurement zone from the centre of rotation are given. The requirements to the algorithms of digital signal processing, which should take into account the peculiarities of laser beam reflection from a non-stationary dynamic surface, are formulated. Possible sources of measurement errors are discussed, and results of such binocular sensor simulation that allow estimating its metrological characteristics for different values of system parameters are produced.
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Sergei Vasilievich Mikhlyaev, "Optical systems for melt level measurement in the process of crystal growth", Proc. SPIE 4900, Seventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life, (29 July 2002); doi: 10.1117/12.484616; https://doi.org/10.1117/12.484616
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