18 October 2002 Research on wet etching at MEMS torsion mirror optical switch
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Proceedings Volume 4902, Optomechatronic Systems III; (2002); doi: 10.1117/12.467343
Event: Optomechatronic Systems III, 2002, Stuttgart, Germany
Abstract
Etching is a very important technique at MEMS micromachining. There are two kinds of etching processing, the one is wet etching and the other is dry etching. In this paper, wet selective etching with KOH and tetramethyl ammonium hydroxide (TMAH) etchants is researched in order to make a torsion mirror optical switch. The experiments results show that TMAH with superphosphate is more suitable at MEMS torsion mirror optical switch micromachining than KOH, and it also has good compatibility with IC processing. Also our experiments results show some different with other reported research data. More work will be done to improve the yield rate of MEMS optical switch.
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Yi Zhang, Jifeng Wang, Yuan Luo, "Research on wet etching at MEMS torsion mirror optical switch", Proc. SPIE 4902, Optomechatronic Systems III, (18 October 2002); doi: 10.1117/12.467343; https://doi.org/10.1117/12.467343
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KEYWORDS
Etching

Microelectromechanical systems

Silicon

Optical switching

Wet etching

Anisotropic etching

Aluminum

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