Paper
18 October 2002 Vertical scanning profilometry using double-exposure camera and two short-coherent-light sources of different wavelengths
Masaaki Adachi, Katsuyuki Inabe
Author Affiliations +
Proceedings Volume 4902, Optomechatronic Systems III; (2002) https://doi.org/10.1117/12.467345
Event: Optomechatronic Systems III, 2002, Stuttgart, Germany
Abstract
We propose a new vertical-scanning profilometry which has potentiality of realizing high-speed measurement. The proposed profilometry measures 3-D shape by use of phase-shifting techniques with a large phase shift 2n π + π/2. With such large shifts, 2 pai phase ambiguities normally suffer precision measurements of phases. Therefore, the profilometry was equipped with two short-coherent-light sources of different wavelengths and a double-exposure camera, and measures the phases of two different wavelengths at nearly the same optical path difference. From the phases and a vertical-scanning step height, 3-D profile is calculated with nanometer precision.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaaki Adachi and Katsuyuki Inabe "Vertical scanning profilometry using double-exposure camera and two short-coherent-light sources of different wavelengths", Proc. SPIE 4902, Optomechatronic Systems III, (18 October 2002); https://doi.org/10.1117/12.467345
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KEYWORDS
Phase shifts

Phase measurement

Cameras

Mirrors

Light sources

Xenon

Algorithm development

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