28 August 2002 Thermo-optic dispersion properties of aluminum nitride with an optical waveguide technique
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Proceedings Volume 4904, Optical Fiber and Planar Waveguide Technology II; (2002) https://doi.org/10.1117/12.481263
Event: Asia-Pacific Optical and Wireless Communications 2002, 2002, Shanghai, China
An aluminum nitride thin film on sapphire substrate was prepared by metal-organic chemical-vapor deposition for optical waveguide study. In order to investigate thermo-optic dispersion properties of aluminum nitride waveguide, a new experimental arrangement is designed. The thermo-optic properties of thin film are obtained using a prism coupled waveguide devices, which has auto-temperature controlling system. The temperature range is 30 ° C — 85° C with the control accuracy of ± 1 ° C. The experiment was carried out by using different light source with wavelength of 441.6 nm, 514.5 nm, and 632.8nm. A set of curve of thermo-optic dispersion of aluminum nitride film is given.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yifang Yuan, Yifang Yuan, Qiyang Zhu, Qiyang Zhu, Baoxue Chen, Baoxue Chen, Changsong Fu, Changsong Fu, Ping Li, Ping Li, } "Thermo-optic dispersion properties of aluminum nitride with an optical waveguide technique", Proc. SPIE 4904, Optical Fiber and Planar Waveguide Technology II, (28 August 2002); doi: 10.1117/12.481263; https://doi.org/10.1117/12.481263


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