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29 August 2002 Loss measurement of oxidized porous silicon optical waveguides by nondestructive end-fire coupling
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Proceedings Volume 4905, Materials and Devices for Optical and Wireless Communications; (2002) https://doi.org/10.1117/12.481045
Event: Asia-Pacific Optical and Wireless Communications 2002, 2002, Shanghai, China
Abstract
The oxidised porous silicon channel waveguides were fabricated by controlling the illumination intensities and anodisation time during anodisation process is reported in this paper. By the technique combined the optimisation end-fire coupling and cut-back methods, the relatively exact results of measured propagation loss, endface' s scattering loss and the mode mismatching loss of oxidised porous silicon channel waveguides were 12.5.2dB/cm, 4.6dB and 3.1dB respectively.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhenhong Jia "Loss measurement of oxidized porous silicon optical waveguides by nondestructive end-fire coupling", Proc. SPIE 4905, Materials and Devices for Optical and Wireless Communications, (29 August 2002); https://doi.org/10.1117/12.481045
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