Translator Disclaimer
20 September 2002 Fabrication and characterization of c-axis-oriented transparent conductive nanocrystalline AZO thin films by rf magnetron sputtering
Author Affiliations +
Abstract
Using high density ZnO:Al2O3 (AZO) target (94%) and without introducing any reaction oxygen, (001)-oriented transparent conductive AZO thin films are prepared by rf planar magnetron sputtering deposition on soda-lime glass. The structural, electrical and optical properties of the films deposited and annealed at different conditions are characterized with various techniques. The as-deposited and post-deposition annealed thin films have highly c-axis-orientated growth with hexagonal structure. Samples deposited at below 360°C are very smooth with spherical grains about tens nano-meters, the crystallization has been improved with vacuum annealing. The experimental results show that AZO thin films with optical transmittance of above 85% at wavelength of 550 nm and electrical resistivity of 10-4 Ωcm order were achieved by deposition at substrate temperature of 360°C and subsequently annealed at 450°C for 2 h in vacuum pressure of 10-5 Torr. With increase of the deposition temperature or post-deposition annealing in vacuum, the carrier concentration of AZO thin film increases, and the absorption edge in transmission spectra shifts toward the shorter wavelength side (blue shift).
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Guojia Fang, Dejie Li, and Bao-Lun Yao "Fabrication and characterization of c-axis-oriented transparent conductive nanocrystalline AZO thin films by rf magnetron sputtering", Proc. SPIE 4919, Advanced Materials and Devices for Sensing and Imaging, (20 September 2002); https://doi.org/10.1117/12.471878
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
Back to Top