Near-field aperture property of a nanometer AgOx thin film

Fu Han Ho; Hsun Hao Chang; Yu Hsaun Lin; Din Ping Tsai

doi:10.1117/12.483309

17 September 2002 Study of near-field aperture property of a nanometer AgO_x thin film

Fu Han Ho, Hsun Hao Chang, Yu Hsaun Lin, Din Ping Tsai

Proceedings Volume 4930, Advanced Optical Storage Technology; (2002) https://doi.org/10.1117/12.483309
Event: Photonics Asia, 2002, Shanghai, China

Abstract

AgOx thin-films were studied by using an optical read-write-tester. Two different states were found by CCD and SEM images, and the optical properties were examined by the pump-probe technique. A scattering center was found in the AgOx thin film. The enhanced reflectance was due to strongly local scattering and plasmon excitations.

Citation Download Citation

Fu Han Ho, Hsun Hao Chang, Yu Hsaun Lin, and Din Ping Tsai "Study of near-field aperture property of a nanometer AgO_x thin film", Proc. SPIE 4930, Advanced Optical Storage Technology, (17 September 2002); https://doi.org/10.1117/12.483309

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