Paper
17 October 2003 Effect of VUV F2 laser irradiation on fluoride crystal
Author Affiliations +
Abstract
The early stage of optical damae caused by F2 laser irradiation on the wide bandgap fluoride crystal, CaF2, is investigated and compared with the case of ArF laser irradiation. Besides a blue emission band due to self-trapped exciton, sharp emission lines appear and grow at a fluence of about 2 J cm-2, showing the initiation of the optical damage and growth of plume from the F2-laser-irradiated surface of CaF2. There exist cracks and melted structures on the laser-damaged surface, which are caused by thermal stress and vaporization due to laser absorption and following local heating.
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Yoshizo Kawaguchi, Aiko Narazaki, Tadatake Sato, and Hiroyuki Niino "Effect of VUV F2 laser irradiation on fluoride crystal", Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); https://doi.org/10.1117/12.479244
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Laser irradiation

Fluorine

Crystals

Laser crystals

Vacuum ultraviolet

Pulsed laser operation

Silica

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