Optical waveguide fabrication inside transparent materials by use of plasma channeling induced by tailored femtosecond laser

Masanao Kamata; Kosuke Ohta; Minoru Obara; Hiroshi Sekita

doi:10.1117/12.479241

17 October 2003 Optical waveguide fabrication inside transparent materials by use of plasma channeling induced by tailored femtosecond laser

Masanao Kamata, Kosuke Ohta, Minoru Obara, Hiroshi Sekita

Author Affiliations +

Proceedings Volume 4977, Photon Processing in Microelectronics and Photonics II; (2003) https://doi.org/10.1117/12.479241
Event: High-Power Lasers and Applications, 2003, San Jose, CA, United States

Abstract

With a loosely focused femtosecond laser, refractive index change is induced in silica glass without any scanning process. By decrease numerical aperture of the incident laser, the induction of irregular structure can be avoided such as clacks and spatial splitting of the induced refractive index change region. We demonstrate controlling of the refractive index change by optimizing the numerical aperture and input energy and input pulsewidth and laser shot number. A new method of fabrication of photonic devices in silica glass is proposed.

Citation Download Citation

Masanao Kamata, Kosuke Ohta, Minoru Obara, and Hiroshi Sekita "Optical waveguide fabrication inside transparent materials by use of plasma channeling induced by tailored femtosecond laser", Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); https://doi.org/10.1117/12.479241

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