17 October 2003 Optical waveguide fabrication inside transparent materials by use of plasma channeling induced by tailored femtosecond laser
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Proceedings Volume 4977, Photon Processing in Microelectronics and Photonics II; (2003); doi: 10.1117/12.479241
Event: High-Power Lasers and Applications, 2003, San Jose, CA, United States
Abstract
With a loosely focused femtosecond laser, refractive index change is induced in silica glass without any scanning process. By decrease numerical aperture of the incident laser, the induction of irregular structure can be avoided such as clacks and spatial splitting of the induced refractive index change region. We demonstrate controlling of the refractive index change by optimizing the numerical aperture and input energy and input pulsewidth and laser shot number. A new method of fabrication of photonic devices in silica glass is proposed.
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Masanao Kamata, Kosuke Ohta, Minoru Obara, Hiroshi Sekita, "Optical waveguide fabrication inside transparent materials by use of plasma channeling induced by tailored femtosecond laser", Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); doi: 10.1117/12.479241; https://doi.org/10.1117/12.479241
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KEYWORDS
Refractive index

Waveguides

Femtosecond phenomena

Plasma

Silica

Laser irradiation

Pulsed laser operation

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