Resonance energy of surface plasmon of nickel nanoparticles in silica glasses

Hiroshi Amekura; Yoshihiko Takeda; Hideaki Kitazawa; Naoki Kishimoto

doi:10.1117/12.478576

17 October 2003 Resonance energy of surface plasmon of nickel nanoparticles in silica glasses

Hiroshi Amekura, Yoshihiko Takeda, Hideaki Kitazawa, Naoki Kishimoto

Proceedings Volume 4977, Photon Processing in Microelectronics and Photonics II; (2003) https://doi.org/10.1117/12.478576
Event: High-Power Lasers and Applications, 2003, San Jose, CA, United States

Abstract

Absorption spectra of Ni nanoparticles in silica glass (SiO₂) fabricated by negative-ion implantation of 60 keV Ni to 4x10¹⁶ ions/cm² were determined from three sets of spectra, i.e., transmittance, reflectance of implanted-surface side and that of rear-surface side, of the same samples, to exclude incoherent multiple reflection (ICMR) due to substrates. Although the absorption spectrum of as-implanted state is smeared with defect absorption, two absorption bands at 3.3 and 6.0 eV due to Ni nanoparticles are observed after annealing at 800°C in vacuum. However, a predicted peak energy from a criterion for surface plasmon resonance (SPR), ε_m'(ω) + 2 ε_d'(ω) = 0, was in 2.8 eV, far away from the observed peaks. Another criterion, (ε_m' + 2ε_d')² + (ε_m'')² = minimum, gives the peak energy of 5.9 eV. From decomposition of the dielectric constants into free- and bound-electron contributions, we conclude that the 3.3 eV peak is SPR-like, although the contribution of the bound-electrons to the 3.3 eV peak is not small. Size dependence also supports the assignment of the 3.3 eV peak. The large contribution of the bound electrons is due to a nature of the partially filled 3d orbitals of Ni. This is contrast to the closed 3d orbitals of Cu, and probably is the origin of the broad peak width.

Citation Download Citation

Hiroshi Amekura, Yoshihiko Takeda, Hideaki Kitazawa, and Naoki Kishimoto "Resonance energy of surface plasmon of nickel nanoparticles in silica glasses", Proc. SPIE 4977, Photon Processing in Microelectronics and Photonics II, (17 October 2003); https://doi.org/10.1117/12.478576

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