Blazed silicon grating made of (111) silicon wafer

Hui Ju; Ping Zhang; Shurong Wang; Jingqiu Liang; Yihui Wu

doi:10.1117/12.478239

15 January 2003 A Blazed silicon grating made of (111) silicon wafer

Hui Ju, Ping Zhang, Shurong Wang, Jingqiu Liang, Yihui Wu

Proceedings Volume 4979, Micromachining and Microfabrication Process Technology VIII; (2003) https://doi.org/10.1117/12.478239
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States

Abstract

So far, the history of silicon gratings has more than 20 years and the development of fabrication methods and applications have improved a lot. Microfabrication process to made silicon gratings can be divided into bulk silicon and surface silicon technology. All these technologies are compatible with the process of MEMS, and this made it possible to fabricate micro spectrometers. We present the fabrication process of a grating by using (111) silicon wafer. The silicon gratings were manufactured using silicon micromachining techniques, as ultraviolet lithography and anisotropic wet etching, achieving good uniformity surface and grating facets of excellent optical quality. Some testing results on the silicon grating are presented.

Citation Download Citation

Hui Ju, Ping Zhang, Shurong Wang, Jingqiu Liang, and Yihui Wu "A Blazed silicon grating made of (111) silicon wafer", Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); https://doi.org/10.1117/12.478239

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