Translator Disclaimer
Paper
15 January 2003 Design rules for the fabrication of binary half-tone masks used for MEMS and photonic devices
Author Affiliations +
Proceedings Volume 4979, Micromachining and Microfabrication Process Technology VIII; (2003) https://doi.org/10.1117/12.478283
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
Gray scale lithography is becoming a popular technique for producing three-dimensional structures needed in fabricating photonics and MEMS devices. The structures are printed using a variable transmission mask to yield the required continuous tone intensity during image formation. In binary half tone imaging (i.e., BHT), the transmission through the mask is adjusted by varying the open area of sub-patterns. Design rules, fabrication tradeoffs and a layout methodology employing a novel primitive cell to aid in constructing the BHT masks are discussed Simulation is leveraged to tie the BHT design with expected imaging results. The overall process is exercised by fabricating a specific grayscale design for use in a photonic application. The BHT mask approach to gray scale lithography is a viable method to fabricate three-dimensional images offering MEMS and photonics communities a cost effective alternative to gray scale masks which rely on specialty materials and films.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter D. Rhyins, Christopher J. Progler, Glenn S Claydon, and Ernest W Balch "Design rules for the fabrication of binary half-tone masks used for MEMS and photonic devices", Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); https://doi.org/10.1117/12.478283
PROCEEDINGS
16 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT


Back to Top