Planar gratings have wide applications and, till date, many methods for the fabrication of gratings have been reported. Ultrashort pulse laser has been used for the machining of gratings primarily due to its ability of direct ablation and its capability to fabricate sub-wavelength structures. In this paper, we present a novel direct ablation technique for the fabrication of planar gratings by interfering ultrashort pulses in a novel optical configuration. This technique not only simplifies the optical setup, but also immunizes the system to extraneous and inherent vibrations, thus enabling planar gratings of good edge acuity. In addition, this technique ensures that gratings are formed only on the focal point. The grating line width can also be adjusted without much change to the optical configuration. With this technique, we have successfully fabricated planar grating of different line-widths on a silicon substrate. Effect of pulse number, and the laser threshold on the grating quality has been qualitatively studied using SEM analysis. This method offers a novel technique for the fabrication of surface relief profile on the metal surface by direct ablation. The optical setup is immune to vibration, at the same time cost effective and fast. Gratings have wide applications and this fabrication technique can be realized commercially.