15 January 2003 Process conditions and lithographic performance of arch durimide polyimides in the ultra-thick film regime
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Proceedings Volume 4979, Micromachining and Microfabrication Process Technology VIII; (2003) https://doi.org/10.1117/12.478241
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
Paper pending release of an erratum.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sylvain Irenee Misat, Rudy J. M. Pellens, Rutger Voets, Angelique van Klaveren, Jean-Paul van den Heuvel, L. Peterson, Pamela J. Waterson, D. Racicot, D. Roza, "Process conditions and lithographic performance of arch durimide polyimides in the ultra-thick film regime", Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); doi: 10.1117/12.478241; https://doi.org/10.1117/12.478241
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