15 January 2003 Process conditions and lithographic performance of arch durimide polyimides in the ultra-thick film regime
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Proceedings Volume 4979, Micromachining and Microfabrication Process Technology VIII; (2003) https://doi.org/10.1117/12.478241
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
Paper pending release of an erratum.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sylvain Irenee Misat, Sylvain Irenee Misat, Rudy J. M. Pellens, Rudy J. M. Pellens, Rutger Voets, Rutger Voets, Angelique van Klaveren, Angelique van Klaveren, Jean-Paul van den Heuvel, Jean-Paul van den Heuvel, L. Peterson, L. Peterson, Pamela J. Waterson, Pamela J. Waterson, D. Racicot, D. Racicot, D. Roza, D. Roza, } "Process conditions and lithographic performance of arch durimide polyimides in the ultra-thick film regime", Proc. SPIE 4979, Micromachining and Microfabrication Process Technology VIII, (15 January 2003); doi: 10.1117/12.478241; https://doi.org/10.1117/12.478241
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