21 January 2003 Stress and curvature in MEMS mirrors
Author Affiliations +
Proceedings Volume 4983, MOEMS and Miniaturized Systems III; (2003) https://doi.org/10.1117/12.472899
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
The goal of this study is to understand how to optimize the performance of micro-mirrors for a variety of optical microsystem applications. Our approach relies on a number of process variations and mirror designs to ultimately produce relatively large (500μm to mm-scale), smooth (for nm RMS), and flat mirrors (greater than 1m curvature). White-light interferometric measurements, and finite element models are discussed in support of these findings. Stress gradients and residual stresses have been measured for accurate modeling of micro-mirrors. Through this modeling study, we have identified relevant structural parameters that will optimize SUMMiT V MEMS mirrors for optical applications. Ways of mitigating surface topography, print-through effects, and RMS roughness are currently being investigated.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fawn R. Gass, Fawn R. Gass, Daryl J. Dagel, Daryl J. Dagel, David P. Adams, David P. Adams, Grant D. Grossetete, Grant D. Grossetete, Olga Blum Spahn, Olga Blum Spahn, Shanalyn A. Kemme, Shanalyn A. Kemme, Seethambal S. Mani, Seethambal S. Mani, Kevin J Malloy, Kevin J Malloy, } "Stress and curvature in MEMS mirrors", Proc. SPIE 4983, MOEMS and Miniaturized Systems III, (21 January 2003); doi: 10.1117/12.472899; https://doi.org/10.1117/12.472899

Back to Top