21 January 2003 Stress and curvature in MEMS mirrors
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Proceedings Volume 4983, MOEMS and Miniaturized Systems III; (2003) https://doi.org/10.1117/12.472899
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
The goal of this study is to understand how to optimize the performance of micro-mirrors for a variety of optical microsystem applications. Our approach relies on a number of process variations and mirror designs to ultimately produce relatively large (500μm to mm-scale), smooth (for nm RMS), and flat mirrors (greater than 1m curvature). White-light interferometric measurements, and finite element models are discussed in support of these findings. Stress gradients and residual stresses have been measured for accurate modeling of micro-mirrors. Through this modeling study, we have identified relevant structural parameters that will optimize SUMMiT V MEMS mirrors for optical applications. Ways of mitigating surface topography, print-through effects, and RMS roughness are currently being investigated.
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Fawn R. Gass, Daryl J. Dagel, David P. Adams, Grant D. Grossetete, Olga Blum Spahn, Shanalyn A. Kemme, Seethambal S. Mani, Kevin J Malloy, "Stress and curvature in MEMS mirrors", Proc. SPIE 4983, MOEMS and Miniaturized Systems III, (21 January 2003); doi: 10.1117/12.472899; https://doi.org/10.1117/12.472899
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