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17 January 2003 Additive lithography for refractive micro-optics
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Proceedings Volume 4984, Micromachining Technology for Micro-Optics and Nano-Optics; (2003) https://doi.org/10.1117/12.477839
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
An innovative fabrication technique is introduced that is based on multiple exposure techniques for micro-optics fabrication. This approach is compatible with conventional lithography systems used in Integrated Circuit manufacturing and can be applied to thick and thin photoresists. The additive concept is centered on the idea of using multiple exposures to remove the desired amount of resist without resorting to multiple etching steps. This presentation will explain how the additive technique, used with thin and thick resists, will revolutionize our capability to efficiently form refractive lenses and micro-optics for optical beam shaping and transforming. The quality and reproducibility of these elements will also be discussed.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mahesh Pitchumani, Heidi Hockel, Jeremiah Brown, Waleed S. Mohammed, and Eric G. Johnson "Additive lithography for refractive micro-optics", Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); https://doi.org/10.1117/12.477839
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