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17 January 2003 Hybrid phase and amplitude modulation proximity printing mask fabricated on DLC and SiO2 substrates
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Proceedings Volume 4984, Micromachining Technology for Micro-Optics and Nano-Optics; (2003) https://doi.org/10.1117/12.477830
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
A hybrid phase and amplitude modulation proximity printing mask was designed, manufactured and tested. The proposed diffractive structure modulates both the phase and the amplitude of a UV exposure beam. In the fused silica substrate a relief is generated in order to modulate the phase and a patterned diamond like carbon layer modulates the amplitude of the UV light. Besides, the diamond like carbon thin film is partially transparent at wavelengths larger than 400 nm, what improves the alignment procedures between different mask levels. The lithographic image was projected onto a resist coated silicon wafer, placed at a distance of 50 micrometer behind the mask, obtaining a resolution better than 1 micrometer, what is impossible with traditional proximity printing techniques.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luiz Goncalves Neto, Giuseppe Antonio Cirino, Ronaldo Domingues Mansano, Patricia S.P. Cardona, and Patrick Verdonck "Hybrid phase and amplitude modulation proximity printing mask fabricated on DLC and SiO2 substrates", Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); https://doi.org/10.1117/12.477830
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