17 January 2003 Zone-plate-array lithography (ZPL): a maskless fast-turn-around system for microoptic device fabrication
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Proceedings Volume 4984, Micromachining Technology for Micro-Optics and Nano-Optics; (2003) https://doi.org/10.1117/12.477856
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
Ever-increasing demands of smaller feature sizes and larger throughputs have catapulted the semicondutor lithography juggernaut to develop immensely complex and expensive systems. However, it is not clear if the lithography needs for microoptic and other “botique” device fabrication are being addressed. ZPAL is a new nanolithography technique which leverages advances in micromechanics and diffractive optics technologies. We present ZPAL as the ideal system for such non-conventional lithography needs.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rajesh Menon, Rajesh Menon, Dario Gil, Dario Gil, David J. D. Carter, David J. D. Carter, Amil Patel, Amil Patel, Henry I. Smith, Henry I. Smith, } "Zone-plate-array lithography (ZPL): a maskless fast-turn-around system for microoptic device fabrication", Proc. SPIE 4984, Micromachining Technology for Micro-Optics and Nano-Optics, (17 January 2003); doi: 10.1117/12.477856; https://doi.org/10.1117/12.477856
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