20 January 2003 Operation of spatial light modulators in DUV light
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Proceedings Volume 4985, MOEMS Display and Imaging Systems; (2003) https://doi.org/10.1117/12.477805
Event: Micromachining and Microfabrication, 2003, San Jose, CA, United States
Abstract
The Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS) has developed spatial light modulators (SLM), which are used in a pattern generator for DUV laser mask writing developed by Micronic Laser Systems. They consist of micromirror arrays and allow massive parallel writing in UV mask writers. The chip discussed here consists of 2048 × 512 individually addressable mirrors and can be run at a frame rate of 1 to 2 kHz. For this application it is necessary that the SLMs can be operated under DUV light without changing their performance. This paper discusses a failure mechanism of the SLMs when operated in DUV light and countermeasures to eliminate this effect.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ulrike Dauderstaedt, Peter Duerr, Mathias Krellmann, Tord Karlin, Uldis Berzinsh, Lars Leonardsson, and Horst Wendrock "Operation of spatial light modulators in DUV light", Proc. SPIE 4985, MOEMS Display and Imaging Systems, (20 January 2003); doi: 10.1117/12.477805; https://doi.org/10.1117/12.477805
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