1 July 2003 Effects of orientation of applied electric field in electrical fixing
Author Affiliations +
Proceedings Volume 4988, Advanced Optical Data Storage; (2003) https://doi.org/10.1117/12.474793
Event: Integrated Optoelectronics Devices, 2003, San Jose, CA, United States
We demonstrate the effects of the applied field orientation during the writing period in electrical fixing. The dependency of the diffraction efficiency on the direction of the applied electric field while writing a hologram is studied. Our experiments show that during writing, when the electric field is applied opposite to the c-axis the grating can be successfully revealed with both positive and negative dc voltages. However, when the grating is written with a field parallel to the c-axis, the grating can only be revealed with a field applied in the opposite direction. This situation generates the largest diffraction efficiency of nearly 78%. Theoretical analyses of these observed phenomena are performed.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Adam Thompson, Adam Thompson, Nadia Nazhestkina, Nadia Nazhestkina, Nadin Roesler, Nadin Roesler, Azad Siahmakoun, Azad Siahmakoun, Galen C. Duree, Galen C. Duree, } "Effects of orientation of applied electric field in electrical fixing", Proc. SPIE 4988, Advanced Optical Data Storage, (1 July 2003); doi: 10.1117/12.474793; https://doi.org/10.1117/12.474793


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