14 July 2003 Fabrication of multimode polymeric waveguides and micromirrors using UV and X-ray lithography
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Proceedings Volume 4991, Organic Photonic Materials and Devices V; (2003) https://doi.org/10.1117/12.475461
Event: Integrated Optoelectronics Devices, 2003, San Jose, CA, United States
Abstract
Polymeric optical multimode waveguides have been fabricated by UV and X-ray lithography for optical interconnects. A UV-curable epoxy based polymer (SU-8) was used for VU contact printing. The material has low optical loss and is thermally stable up to 200°C. Polymethylacralate (PMMA) was used as the core layer which is a positive x-ray resist and optically transparent in visible and near IR region. The propagation loss of the fabricated multimode waveguides by the UV contact printing method was 0.36 dB/cm. Waveguide losses of 0.33 dB/cm at 633 nm and 0.54 dB/cm at 830 nm was obtained using PMMA waveguides fabricated by x-ray lithography. The losses of micromirrors were as low as 0.43 dB at both wavelengths.
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Joon-Sung Kim, Joon-Sung Kim, Jae-Wook Kang, Jae-Wook Kang, Jang-Joo Kim, Jang-Joo Kim, } "Fabrication of multimode polymeric waveguides and micromirrors using UV and X-ray lithography", Proc. SPIE 4991, Organic Photonic Materials and Devices V, (14 July 2003); doi: 10.1117/12.475461; https://doi.org/10.1117/12.475461
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