Paper
22 May 2003 Automated image registration in semiconductor industry: a case study in the direct-to-digital holography inspection system
X. Long Dai, Martin A. Hunt
Author Affiliations +
Proceedings Volume 5011, Machine Vision Applications in Industrial Inspection XI; (2003) https://doi.org/10.1117/12.479688
Event: Electronic Imaging 2003, 2003, Santa Clara, CA, United States
Abstract
Automated image registration based on pattern recognition is a critical procedure in many applications of machine vision and is essential for accurate navigation and change detection. In this paper, an overview of the specific applications of image registration in wafer inspection is given, followed by a case study in the application of image registration for direct to digital holography (DDH) wafer inspection. A complete system of novel algorithms for holographic image capable of accepting a variety of data streams as inputs: (1) complex frequency data; (2) complex spatial data; (3) magnitude of data extracted from holograms; (4) phase data extracted from holograms; and (5) intensity-only data. This flexibility facilitates the development of faster, more reliable, and more efficient DDH processing systems, which is important in system optimization and production. In particular, the system enables the use of the full complex wavefront, which contains both reflectance and structural topology information, in the registration process. The added information contained in the wavefront can be utilized for increased robustness and computational efficiency. Both the theory and implementation of the proposed registration system are briefly described within the framework of DDH processing for wafer inspection tasks. Several examples of defect detection and wafer alignment are given with estimates of accuracy and robustness.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
X. Long Dai and Martin A. Hunt "Automated image registration in semiconductor industry: a case study in the direct-to-digital holography inspection system", Proc. SPIE 5011, Machine Vision Applications in Industrial Inspection XI, (22 May 2003); https://doi.org/10.1117/12.479688
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Cited by 6 scholarly publications.
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KEYWORDS
Image registration

Semiconducting wafers

Fourier transforms

Optical alignment

Holograms

Wafer inspection

Defect detection

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