Paper
22 May 2003 Tunnel profile measurement by vision metrology toward application to NATM
Susumu Hattori, Keiichi Akimoto, Tetsu Ono, Satoru Miura
Author Affiliations +
Proceedings Volume 5011, Machine Vision Applications in Industrial Inspection XI; (2003) https://doi.org/10.1117/12.477510
Event: Electronic Imaging 2003, 2003, Santa Clara, CA, United States
Abstract
The NATM, a widely used tunnel excavation method, requires precise periodical monitoring of deformations especially at fault zones, which tends to hamper traffics with conventional measurement means. In this paper vision metrology was applied to tunnel profile measurement with a view to developing a new method. Two hundred of Retro-targets are placed on a one-meter spacing lattice at a tunnel site of 7m in diameter and 15m in longitude, and 66 images were taken to cover the target field. The object space coordinates of targets obtained by bundle adjustment were compared with ones obtained by high-precision total station observation. The root mean square (RMS) of differences of coordinates was 0.548mm, which is precise enough for monitoring deformations for the NATM.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Susumu Hattori, Keiichi Akimoto, Tetsu Ono, and Satoru Miura "Tunnel profile measurement by vision metrology toward application to NATM", Proc. SPIE 5011, Machine Vision Applications in Industrial Inspection XI, (22 May 2003); https://doi.org/10.1117/12.477510
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Cited by 2 scholarly publications.
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KEYWORDS
Metrology

Cameras

Image segmentation

Inspection

Photogrammetry

Target recognition

Antennas

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