Phase elements by means of a photolithographic system employing a spatial light modulator

Ivo Aubrecht; Miroslav Miler; Jan Pala

doi:10.1117/12.498247

8 July 2003 Phase elements by means of a photolithographic system employing a spatial light modulator

Ivo Aubrecht, Miroslav Miler, Jan Pala

Proceedings Volume 5036, Photonics, Devices, and Systems II; (2003) https://doi.org/10.1117/12.498247
Event: Photonics, Devices, and Systems II, 2002, Prague, Czech Republic

Abstract

The system employs a spatial light modulator (SLM), between a pair of crossed polarizers, and an electronic shutter. Transmission of the SLM with the polarizers is controlled by graphical software that defines which pixels are fully transparent and which are fully opaque. While a particular binary graphics is on the SLM the electronic shutter allows light to pass for a certain time. The graphics is imaged, by an objective, onto a photoresist plate. A mercury lamp is used as a light source. The graphics changes after each exposition and the whole sequence of images determines the resultant surface-relief modulation.

Citation Download Citation

Ivo Aubrecht, Miroslav Miler, and Jan Pala "Phase elements by means of a photolithographic system employing a spatial light modulator", Proc. SPIE 5036, Photonics, Devices, and Systems II, (8 July 2003); https://doi.org/10.1117/12.498247

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