16 June 2003 Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes
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Abstract
An experimental extreme UV (EUV) interferometer (EEI) using an undulator light source was designed and constructed for the purpose of developing wavefront measurement technology with the exposure wavelength of the projection optics of EUV lithography systems. EEI has the capability of performing five different EUV wavefront metrology methods.
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Katsuhiko Murakami, Katsuhiko Murakami, Jun Saito, Jun Saito, Kazuya Ota, Kazuya Ota, Hiroyuki Kondo, Hiroyuki Kondo, Mikihiko Ishii, Mikihiko Ishii, Jun Kawakami, Jun Kawakami, Tetsuya Oshino, Tetsuya Oshino, Katsumi Sugisaki, Katsumi Sugisaki, Yucong Zhu, Yucong Zhu, Masanobu Hasegawa, Masanobu Hasegawa, Yoshiyuki Sekine, Yoshiyuki Sekine, Seiji Takeuchi, Seiji Takeuchi, Chidane Ouchi, Chidane Ouchi, Osamu Kakuchi, Osamu Kakuchi, Yutaka Watanabe, Yutaka Watanabe, Takayuki Hasegawa, Takayuki Hasegawa, Shinichi Hara, Shinichi Hara, Akiyoshi Suzuki, Akiyoshi Suzuki, } "Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.484935; https://doi.org/10.1117/12.484935
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