16 June 2003 Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography
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Abstract
A radiation-magnetohydrodynamic (MHD) model of gas discharges has been developed to accelerate the development of compact, intense sources of EUV radiation for microlithography. The model is an MHD numerical simulation with atomic and radiation physics. The plasma evolution is simulated with the MHRDR (Magneto-Hydro-Radiative-Dynamic-Research) 2D, three-temperature, MHD computer code. The MHD results are postprocessed with a code that calculates the 13.4-nm EUV radiation output from Xe ions, based on a detailed collisional-radiative atomic kinetics model. Modeling of a dense plasma focus discharge, in a Xe-He gas mixture, has been initiated with this new tool.
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Bruno S. Bauer, Bruno S. Bauer, Andrey Esaulov, Andrey Esaulov, Volodymyr Makhin, Volodymyr Makhin, Roberto C. Mancini, Roberto C. Mancini, Ioana Paraschiv, Ioana Paraschiv, Radu Presura, Radu Presura, Irvin R. Lindemuth, Irvin R. Lindemuth, Peter T. Sheehey, Peter T. Sheehey, Bryan J. Rice, Bryan J. Rice, } "Development of radiation-magnetohydrodynamic computer modeling of gas-discharge EUV sources for microlithography", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.484933; https://doi.org/10.1117/12.484933
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