Fabrication of Step and Flash imprint lithography templates using commercial mask processes

Ecron Thompson; Peter D. Rhyins; Ronald D. Voisin; S. V. Sreenivasan; Patrick M. Martin

doi:10.1117/12.490141

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16 June 2003 Fabrication of Step and Flash imprint lithography templates using commercial mask processes

Ecron Thompson, Peter D. Rhyins, Ronald D. Voisin, S. V. Sreenivasan, Patrick M. Martin

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Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.490141
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

This article presents the results of a collaborative effort between Molecular Imprints, Inc. (MII) and Photronics, Inc. to develop a baseline process for fabricating Step and Flash Imprint Lithography (S-FIL) templates that are compatible with lithography tools being developed by MII. S-FIL is a replication technique with sub-50nm resolution capability that has the potential to lead to a low cost, high throughput process. Template fabrication results and S-FIL patterning results on 200mm wafers are presented.

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Ecron Thompson, Peter D. Rhyins, Ronald D. Voisin, S. V. Sreenivasan, and Patrick M. Martin "Fabrication of Step and Flash imprint lithography templates using commercial mask processes", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.490141

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