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16 June 2003 Fabrication of Step and Flash imprint lithography templates using commercial mask processes
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Abstract
This article presents the results of a collaborative effort between Molecular Imprints, Inc. (MII) and Photronics, Inc. to develop a baseline process for fabricating Step and Flash Imprint Lithography (S-FIL) templates that are compatible with lithography tools being developed by MII. S-FIL is a replication technique with sub-50nm resolution capability that has the potential to lead to a low cost, high throughput process. Template fabrication results and S-FIL patterning results on 200mm wafers are presented.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ecron Thompson, Peter D. Rhyins, Ronald D. Voisin, S. V. Sreenivasan, and Patrick M. Martin "Fabrication of Step and Flash imprint lithography templates using commercial mask processes", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.490141
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