High-conversion-efficiency tin material laser-plasma source for EUVL

Chiew-Seng Koay; Christian K. Keyser; K. Takenoshita; Etsuo Fujiwara; Moza M. Al-Rabban; Martin C. Richardson; I. C. Edmond Turcu; Harry Rieger; A. Stone; James H. Morris

doi:10.1117/12.504572

16 June 2003 High-conversion-efficiency tin material laser-plasma source for EUVL

Chiew-Seng Koay, Christian K. Keyser, K. Takenoshita, Etsuo Fujiwara, Moza M. Al-Rabban, Martin C. Richardson, I. C. Edmond Turcu, Harry Rieger, A. Stone, James H. Morris

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.504572
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

One of the key leverage factors in determining the viability of laser-plasma sources for EUVL is the conversion efficiency of laser light to EUV emission in the 13-nm region. We describe experiments and theoretical calculations on a mass-limited laser target design using tin that offers high conversion efficiency.

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Chiew-Seng Koay, Christian K. Keyser, K. Takenoshita, Etsuo Fujiwara, Moza M. Al-Rabban, Martin C. Richardson, I. C. Edmond Turcu, Harry Rieger, A. Stone, and James H. Morris "High-conversion-efficiency tin material laser-plasma source for EUVL", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.504572

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