16 June 2003 Masked ion beam lithography and direct structuring on curved surfaces
Author Affiliations +
We have previously demonstrated (Proc. SPIE Vol. 4688, 595, 2002; JM3 Vol. 2, Nr. 1, 34, 2003) a depth of focus of several millimeters in masked ion beam lithography (MIBL). This work illustrates the use of this capability to pattern concave and convex spherical substrates 25 mm in diameter and 5.5 mm deep. Features as small as 175nm were printed across a convex substrate with 75 keV He+ ions where the mask-to-wafer gap varied from 1 mm on the center to 6.5 mm on the edge. We also demonstrate, for the first time, the fabrication of 800 nm features in a 4 nm thick Cr coating by masked ion beam direct structuring (MIBS), where 45 keV Argon ions sputter the film through a stencil mask. We demonstrate electronic adjustment of the radial beam profile of the incident ion beam to compensate for the continuously changing angle between the beam and the spherical substrate, thus achieving constant exposure dose (for MIBL) or sputtering rate (for MIBS) a 50 × 50 mm2 field.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans Loeschner, Hans Loeschner, Herbert Buschbeck, Herbert Buschbeck, Martin Ecker, Martin Ecker, Christoph Horner, Christoph Horner, Elmar Platzgummer, Elmar Platzgummer, Gerhard Stengl, Gerhard Stengl, Michaela Zeininger, Michaela Zeininger, Paul Ruchhoeft, Paul Ruchhoeft, John Charles Wolfe, John Charles Wolfe, } "Masked ion beam lithography and direct structuring on curved surfaces", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.482716; https://doi.org/10.1117/12.482716


Masked Ion Beam Lithography Using Stencil Masks
Proceedings of SPIE (June 17 1984)
Focused-ion-beam repair of phase-shift photomasks
Proceedings of SPIE (July 08 1992)
Repair Of Photomasks With Focussed Ion Beams
Proceedings of SPIE (June 19 1985)
Ion beam imprinting system
Proceedings of SPIE (May 05 2005)

Back to Top