16 June 2003 Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme-ultraviolet lithography
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Abstract
We fabricated molybdenum (Mo)/silicon (Si) multilayers with a low-pressure rotary magnet cathode (RMC) sputtering system under several deposition conditions and investigated their properties. We obtained a high extreme UV (EUV) reflectivity of approximately 71% as measured in Mo/Si multilayers sputtered with low-pressure xenon (Xe) gas. We confirmed that the multilayers sputtered with Xe gas exhibited higher reflectivity than those sputtered with argon (Ar) gas, and that the multilayers sputtered at a lower pressure exhibited higher reflecitivty than those sputtered at a higher pressure. From trans mission electron microscope (TEM) cross-sectional images of the high-reflectivity Mo/Si multilayers, we observed thinner interdiffusion layers between the Mo and Si layers than those in Mo/Si multilayer where a 50-pair multilayer with a Γ ratio (the fractional thickness ratio of a Mo layer to the total thickness of a Mo layer and a Si layer) of 0.35 with compressive stress was stacked upon a 30-pair multilaeyr with a Γ ratio of 0.7 with tensile stress.
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Masayuki Shiraishi, Noriaki Kandaka, Katsuhiko Murakami, "Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme-ultraviolet lithography", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.484436; https://doi.org/10.1117/12.484436
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