New approach to measurement of photoactive deep-UV optics contaminants at sub parts-per-trillion levels

Chris Atkinson; Jeff Hanson; Oleg P. Kishkovich; Michael Paul Alexander; Anatoly Grayfer

doi:10.1117/12.504574

16 June 2003 New approach to measurement of photoactive deep-UV optics contaminants at sub parts-per-trillion levels

Chris Atkinson, Jeff Hanson, Oleg P. Kishkovich, Michael Paul Alexander, Anatoly Grayfer

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.504574
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

A new sampling device and collection method has been developed to provide an accurate and convenient means for collecting ultra low levels of condensable organic species. The sample collection and analytical method are optimized to separate, quantify, and identify individual organic components at a detection limit of approximately 0.001 μg/m³, representing a hundred fold improvement over conventional sampling methods. Given the potential threats that these contaminants pose to deep UV lithography optics, the work represents a new step in understanding the long-term risks to production 193nm exposure tools. Devices deployed at an Texas Instruments manufacturing facility have generated data that proves that this sampling device and method is capable of measuring contamination at levels never achieved before. This data will be used to develop correlation of optics degradation with different classes of airborne molecular contamination.

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Chris Atkinson, Jeff Hanson, Oleg P. Kishkovich, Michael Paul Alexander, and Anatoly Grayfer "New approach to measurement of photoactive deep-UV optics contaminants at sub parts-per-trillion levels", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.504574

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