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16 June 2003 Subfield scheduling for throughput maximization in electron-beam photomask fabrication
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Abstract
Resist heating is one of the largest contributors to critical dimension (CD) distortion in electron beam photomask fabrication. Previous methods for reducing CD variation caused by resist heating include lower beam currents, increased delays between electron flashes, and writing in multiple passes. However, all these methods lower mask writing throughput. This leads to increased mask writing cost, which is increasingly becoming a major limiting factor to semiconductor industry productivity. In this work, we investigate a new degree of freedom for mitigating CD distortion caused by resist heating. By optimizing the sequence in which subfields are being written, it is possible to reduce CD variability caused by resist heating, without significantly increasing the mask writing time.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sergey V. Babin, Andrew B. Kahng, Ion I. Mandoiu, and Swamy Muddu "Subfield scheduling for throughput maximization in electron-beam photomask fabrication", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); https://doi.org/10.1117/12.484981
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