16 June 2003 System and process learning in a full-field, high-power EUVL alpha tool
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Abstract
Full-field imaging with a developmental projection optic box (POB 1) was successfully demonstrated in the alpha tool Engineering Test Stand (ETS) last year. Since then, numerous improvements, including laser power for the laser-produced plasma (LPP) source, stages, sensors, and control system have been made. The LPP has been upgraded from the 40 W LPP cluster jet source used for initial demonstration of full-field imaging to a high-power (1500 W) LPP source with a liquid Xe spray jet. Scanned lithography at various laser drive powers of >500 W has been demonstrated with virtually identical lithographic performance.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William P. Ballard, Daniel A. Tichenor, Donna J. O'Connell, Luis J. Bernardez, Robert E. Lafon, Richard J. M. Anderson, Alvin H. Leung, Kenneth A. Williams, Steven J. Haney, Yon E. Perras, Karen L. Jefferson, Therese L. Porter, Daniel Knight, Pamela K. Barr, James L. Van de Vreugde, Richard H. Campiotti, Mark D. Zimmerman, Terry A. Johnson, Leonard E. Klebanoff, Philip A. Grunow, Samuel Graham, Dean A. Buchenauer, William C. Replogle, Tony G. Smith, John B. Wronosky, Joel R. Darnold, Kenneth L. Blaedel, Henry N. Chapman, John S. Taylor, Layton C. Hale, Gary E. Sommargren, Eric M. Gullikson, Patrick P. Naulleau, Kenneth A. Goldberg, Sang Hun Lee, Harry Shields, Randall J. St. Pierre, Samuel Ponti, "System and process learning in a full-field, high-power EUVL alpha tool", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.482791; https://doi.org/10.1117/12.482791
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