Use of tin as a plasma source material for high conversion efficiency

Toshihisa Tomie; Tatsuya Aota; Yoshifumi Ueno; Gohta Niimi; Hidehiko Yashiro; Jingqian Lin; Isao Matsushima; Kazumasa Komiyama; Dong-Hoon Lee; Kentaro Nishigori; Hiroshi Yokota

doi:10.1117/12.483751

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16 June 2003 Use of tin as a plasma source material for high conversion efficiency

Toshihisa Tomie; Tatsuya Aota; Yoshifumi Ueno; Gohta Niimi; Hidehiko Yashiro; Jingqian Lin; Isao Matsushima; Kazumasa Komiyama; Dong-Hoon Lee; Kentaro Nishigori; Hiroshi Yokota

Author Affiliations +

Proceedings Volume 5037, Emerging Lithographic Technologies VII; (2003) https://doi.org/10.1117/12.483751
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Debris-free generation of a tin plasma was demonstrated in the cavity-confined configuration. Narrow band emission at 13.7-nm was observed in an emission spectrum of a cavity confined tin plasma. The spectral efficiency was as high as 12% and we found the conversion efficiency could reach 6%/2π str ultimately while lots of works are required to achieve this value. We also confirmed a magnetic field has some effect of stopping a plasma.

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Toshihisa Tomie, Tatsuya Aota, Yoshifumi Ueno, Gohta Niimi, Hidehiko Yashiro, Jingqian Lin, Isao Matsushima, Kazumasa Komiyama, Dong-Hoon Lee, Kentaro Nishigori, and Hiroshi Yokota "Use of tin as a plasma source material for high conversion efficiency", Proc. SPIE 5037, Emerging Lithographic Technologies VII, (16 June 2003); doi: 10.1117/12.483751; https://doi.org/10.1117/12.483751

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