PROCEEDINGS VOLUME 5038
MICROLITHOGRAPHY 2003 | 23-28 FEBRUARY 2003
Metrology, Inspection, and Process Control for Microlithography XVII
Editor(s): Daniel J. Herr
Editor Affiliations +
MICROLITHOGRAPHY 2003
23-28 February 2003
Santa Clara, California, United States
Defect Analysis
Christian J. Schwarz, Yuliya Kuznetsova, Steven R. J. Brueck
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483429
Ludwig van Loyen, Thomas Boettger, Stefan Braun, Hermann Mai, Andreas Leson, Frank Scholze, Johannes Tuemmler, Gerhard Ulm, Herbert Legall, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485042
Allan Tram, Jeff J. Spiegelman, Russell J. Holmes, Daniel Alvarez, Dan Lev
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.488483
Jerry Lu, Alex Lu, Linyong Pang, Don Lee, Jiunn-Hung Chen
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485010
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482811
Overlay and Registration Metrology I
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482817
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483661
Simon Chang, Stephen J. DeMoor, Jay M. Brown, Chris Atkinson, Joshua A. Roberge
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483662
Moitreyee Mukherjee-Roy, Navab Singh, Sohan Singh Mehta, Wai Meng Chik, Chin Tiong Sim, Francis Cheong
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482800
Richard M. Silver, Michael T. Stocker, Ravikiran Attota, Michael Bishop, Jau-Shi Jay Jun, Egon Marx, Mark P. Davidson, Robert D. Larrabee
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.488486
Tobias Mono, Uwe Paul Schroeder, Dieter Nees, Katrin Palitzsch, Wolfram Koestler, Jens Bruch, Sirko Kramp, Markus Veldkamp, Ralf Schuster
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485019
Critical Dimension Metrology I
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485012
Ronald G. Dixson, Angela Guerry, Marylyn Hoy Bennett, Theodore V. Vorburger, Benjamin D. Bunday
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483667
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483690
Roman Liebe, Henning Haffner, Shirley Hemar, Anja Rosenbusch, Jerry Xiaoming Chen, Franklin D. Kalk
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483535
Shoaib Hasan Zaidi, George Stojakovic, Alois Gutmann, Cornel Bozdog, Ulrich Mantz, Sylvie Bosch Charpenay, Peter A. Rosenthal
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.484998
Scatterometry
Ronald L. Jones, Tengjiao Hu, Eric K. Lin, Wen-li Wu, Diego M. Casa, N. George Orji, Theodore V. Vorburger, Patrick J. Bolton, George G. Barclay
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483669
Weidong Yang, Roger Lowe-Webb, Silvio Rabello, Jiangtao Hu, Je-Yi Lin, John D. Heaton, Mircea V. Dusa, Arie J. den Boef, Maurits van der Schaar, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483476
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485037
J. Scott Hodges, Yu-Lun Chris Lin, Dale R. Burrows, Ray H. Chiao, Robert M. Peters, Srinivasan Rangarajan, Kamal N. Bhatia, Suresh Lakkapragada
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485002
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.488117
Process Control and Characterization I
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482807
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483473
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485025
David Herisson, DaniEle Neira, Cyril Fernand, Philippe Thony, Daniel Henry, Stephanie Kremer, Marco Polli, Marco Guevremont, Assim Elazami
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485031
Thomas Hingst, Thomas Marschner, Manfred Moert, Jan Homilius, Marco Guevremont, John Hopkins, Assim Elazami
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485011
Mask-Related Metrology
Process Control and Characterization II
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483664
Lena Zavyalova, Chong-Cheng Fu, Gary Stanley Seligman, Perry A. Tapp, Victor Pol
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483665
Bernd Schulz, Jens Krause, John Charles Robinson, Craig W. MacNaughton
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483470
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485016
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485040
Jongkyun Hong, Chongsik Woo, Jaewoo Park, Byeong-ho Cho, Jaeseung Choi, Hyunjo Yang, Chan-ha Park, Yong-chul Shin, Youngdea Kim, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485026
Overlay and Registration Metrology II
Dae-Ung Shin, Young-Bae Jeong, Jeong-Lyeol Park, Jae-Sung Choi, Jeong-Gun Lee, Dae-Hoon Lee
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485032
Ravikiran Attota, Richard M. Silver, Michael T. Stocker, Egon Marx, Jau-Shi Jay Jun, Mark P. Davidson, Robert D. Larrabee
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.488481
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483430
Mike Adel, John A. Allgair, David C. Benoit, Mark Ghinovker, Elyakim Kassel, C. Nelson, John Charles Robinson, Gary Stanley Seligman
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483477
Materials-Related Metrology I
Critical Dimension Metrology II
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485021
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485033
Bernardo D. Aumond, Kamal Youcef-Toumi
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482649
Ryoichi Matsuoka, Masanori Takahashi, Atsushi Uemoto
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483688
Scatterometry II
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.488484
Eytan Barouch, Stephen L. Knodle
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.488480
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483692
Christopher J. Raymond, Michael E. Littau, Byoungjoo James Youn, Chang-Jin Sohn, Jin Ah Kim, Young Seog Kang
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.488116
Materials-Related Metrology II
Top-Down Methods
Maki Tanaka, Chie Shishido, Yuji Takagi, Hidetoshi Morokuma, Osamu Komuro, Hiroyoshi Mori
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483685
Takafumi Morimoto, Toru Shinaki, Yukio Kembo, Sumio Hosaka
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482813
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483512
Arkady V. Nikitin, Albert Sicignano, Dmitriy Y. Yeremin, Matthew Sandy, E. Tim Goldburt
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485017
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485041
Line-Edge Roughness and Tool Related Metrology
Poster Session
Volker Tympel, Roberto Witt, Shannon Layland
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482639
Sheng-Bai Zhu
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482642
Hirokimi Shirasaki, Kunio Ueta, Noriyuki Kondou
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482643
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482645
Wenzhan Zhou, ZhiQiang Li, Luke Kok Chin Ng, Teng Hwee Ng, Hui Kow Lim
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482651
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482669
Beth Russo, Michael Bishop
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482674
Masahiro Horie, Kamil Postava, Tomuo Yamaguchi, Kumiko Akashika, Hideki Hayashi, Fujikazu Kitamura
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482678
Sabita Roy, J. Fung Chen, Armin Liebchen, Thomas L. Laidig, Kurt E. Wampler, Uwe Hollerbach
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482746
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483431
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483432
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483435
Yong-Seok Choi, Yun-Hwan Kim, Gon-Ho Kim, Hye-Keun Oh, Ilsin An
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483478
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483513
Hiroki Kawada, Takashi Iizumi, Tadashi Otaka
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483658
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483659
Se-Jin Park, Hong-Rae Kim, Yong-Suk Lee, Won-Sik Yang
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483660
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482799
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482808
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482809
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482810
Jeroen Huijbregste, Richard J. F. van Haren, Andre Jeunink, Paul C. Hinnen, Bart Swinnen, Ramon Navarro, Geert Simons, Frank van Bilsen, Hoite Tolsma, et al.
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482814
Shirley Hemar, Anja Rosenbusch, Reuven Falah
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482815
Byong Chon Park, Jae-Hyun Kang, Ki Young Jung, Won Young Song, Beomhoan O, TaeBong Eom
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482816
Philip D. Rack, Alexander Thesen, Stephen Randolph, Jason D. Fowlkes, David C. Joy
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482822
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482831
Albert Sicignano, Dmitriy Y. Yeremin, Matthew Sandy, E. Tim Goldburt
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.482833
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483536
Holly H. Magoon, Shawn R. Goddard, Alois Kaufmann
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483754
Justin J. Hwu, Sukhbir S. Dulay, Thao Pham
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483757
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.484999
Heping Wang, Terry Toddy, Stephen Gibbons, Trisha May
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485000
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485001
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.485006
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483663
Proceedings Volume Metrology, Inspection, and Process Control for Microlithography XVII, (2003) https://doi.org/10.1117/12.483666
Overlay and Registration Metrology I
Hsu-Ting Huang, Gayathri Raghavendra, Apo Sezginer, Kenneth Johnson, Fred E. Stanke, Michelle L. Zimmerman,