2 June 2003 Contact hole inspection by real-time optical CD metrology
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Abstract
We have developed fast numerical solutions to the diffraction of light from a periodic array of contact holes (CH) in microelectronic structures. We present results for contact holes in oxide and in 193 nm and 248 nm photoresists. We also show detectability limits of the CH and observed variations across wafers processed with state-of-the-art lithography.
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Jon L. Opsal, Jon L. Opsal, Hanyou Chu, Hanyou Chu, Youxian Wen, Youxian Wen, Guangwei Li, Guangwei Li, Yia-Chung Chang, Yia-Chung Chang, } "Contact hole inspection by real-time optical CD metrology", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.487607; https://doi.org/10.1117/12.487607
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