Measurement of the dielectric function spectra of low dielectric constant using spectroscopic ellipsometry

Masahiro Horie; Kamil Postava; Tomuo Yamaguchi; Kumiko Akashika; Hideki Hayashi; Fujikazu Kitamura

doi:10.1117/12.482678

2 June 2003 Measurement of the dielectric function spectra of low dielectric constant using the spectroscopic ellipsometry

Masahiro Horie, Kamil Postava, Tomuo Yamaguchi, Kumiko Akashika, Hideki Hayashi, Fujikazu Kitamura

Author Affiliations +

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.482678
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The dielectric function spectra of low dielectric constants (low-k) materials have been determined using spectroscopic ellipsometry, normal incidence spectroscopic reflectometry, and Fourier transform infrared transmission spectrometry over a wide spectral range from 0.03 to 5.4 eV (230nm to 40.5um wavelength region). The electric and ionic contributions to the overall static dielectric constants were determined for representative materials used in the semiconductor industry for interlayer dielectrics: (1) FLARE - organic spin-on polymer, (2) HOSP - spin-on hybrid organic-siloxane polymer from the Honeywell Electric Materials Company, and (3) SiLK- organic dielectric resin from the Dow Chemical Company. The main contributions to the static dielectric constant of the low-k materials studied were found to be the electric and ionic absorption.

Citation Download Citation

Masahiro Horie, Kamil Postava, Tomuo Yamaguchi, Kumiko Akashika, Hideki Hayashi, and Fujikazu Kitamura "Measurement of the dielectric function spectra of low dielectric constant using the spectroscopic ellipsometry", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.482678

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