2 June 2003 Optical digital profilometry applications on contact holes
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Abstract
Optical scatterometry and Optical Digital Profiling (ODP) have become mainstram technology in CD and profile metrology. Without question, the extension of these techniques to measure 3D patterns such as contact holes or posts is an important demand. In this paper, we demonstrate the application of ODP to contact holes and posts for both lithography and etch processes. The underlying theory based onthe Rigorous Coupled Wave Approach is outlined and metrology results are compared with simulations.
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Joerg Bischoff, Xinhui Niu, Nickhil H. Jakatdar, "Optical digital profilometry applications on contact holes", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.483686; https://doi.org/10.1117/12.483686
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