2 June 2003 Portable phase measuring interferometer using Shack-Hartmann method
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A real-time inspection is useful and effective to optimize lens aberrations of excimer-exposure sytem, which can expose patterns less than 100 nm. We have developed a portable i.e., compact and lightweight phase measuring interferometer (P-PMI), which can be attached to a stage of the exposure system during real-time monitoring the aberration of the projection lens mounted on the exposure system. Measured repeatability of the wavefront measurement is ab out 0.1 mλ and tool-to-tool difference is 0.6mλ. Measured wavefront during adjusting a projection lens agree dwell with a simulated result. LWA was successfully optimized using P-PMI data.
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Toru Fujii, Jun Kougo, Yasushi Mizuno, Hiroshi Ooki, Masato Hamatani, "Portable phase measuring interferometer using Shack-Hartmann method", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); doi: 10.1117/12.482699; https://doi.org/10.1117/12.482699

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