Zero-shrink dimension evaluated for ArF-resist patterns measured by CD-SEM

Hiroki Kawada; Takashi Iizumi; Tadashi Otaka

doi:10.1117/12.483658

2 June 2003 Zero-shrink dimension evaluated for ArF-resist patterns measured by CD-SEM

Hiroki Kawada, Takashi Iizumi, Tadashi Otaka

Proceedings Volume 5038, Metrology, Inspection, and Process Control for Microlithography XVII; (2003) https://doi.org/10.1117/12.483658
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Resist patterns for ArF-laser lithography slim by electron radiation in Critical Dimension-Scanning Electron Microscope (CD-SEM). To estimate initial CD that includes no LWS, the CD at 0th measurement was extrapolated from shrink-curve that indicates the slimming. Invisible slimming, occurring between the 0th and 1st measurement, was estimated. We made software for CD-SEM to calculate the 0th-CD. Estimation error in the extrapolated 0th-CD was estimated less than 0.9 nm, and the overall slimming including the invisible shrink was 0.3 nm in line-shaped patterns.

Citation Download Citation

Hiroki Kawada, Takashi Iizumi, and Tadashi Otaka "Zero-shrink dimension evaluated for ArF-resist patterns measured by CD-SEM", Proc. SPIE 5038, Metrology, Inspection, and Process Control for Microlithography XVII, (2 June 2003); https://doi.org/10.1117/12.483658

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