Translator Disclaimer
12 June 2003 Simple optical system parameter optimization method by comparing the critical dimension
Author Affiliations +
Abstract
Resolution enhancement technology will play a crucial role in the future of optical lithography. The only question is how much the resolution limit can be extended. The better critical dimension (CD) uniformity is demanded as pattern size is decreased. In our previous work, we had made a simulation tool which can find the optimum illumination system such as numerical aperture, wavelength, and illumination shape for best CD control. In order to improve better CD control, the mask size, assist feature size and placement are modified by the simulated annealing (SA) algorithm. However, in this method, the effects of post exposure bake or development process are not considered to predict the real CD, since the results are obtained only with the aerial image which can be precisely calculated. To consider these elements that affect CD profile, threshold energy resist model (TERM) model was suggested previously. However, TERM model still has a weak point in extracting necessary parameters for the transfer function. Therefore, we made a simulation tool using Monte Carlo method that extracts the necessary parameters with the experimental data. The experimental data include the exposure energy, measured line CD on a mask, wafer line CD after development. Finally, the predicted line CDs are compared to the empirical data under a different optical system condition to verify the extracted parameters. The simulation results matching the actual process can be obtained by using these methods.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mi-Ae Ha, Dong-Soo Sohn, Kyoung-Ah Jun, Ji-Yong Yoo, Hye-Keun Oh, Jaesoon Kim, and In-Ho Park "Simple optical system parameter optimization method by comparing the critical dimension", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485070
PROCEEDINGS
9 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

Mask critical dimension error on optical lithography
Proceedings of SPIE (July 19 2000)
Patterning ULSI Circuits
Proceedings of SPIE (June 14 1996)
Isolated-grouped linewidth bias on SVGL Micrascan
Proceedings of SPIE (August 08 1993)
Patterning ULSI circuits
Proceedings of SPIE (June 07 1996)

Back to Top