Novel apparatus for the uniform heating of substrates during post expose bake

Gary Hillman; Pierre Infelta

doi:10.1117/12.485109

12 June 2003 Novel apparatus for the uniform heating of substrates during post expose bake

Gary Hillman, Pierre Infelta

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485109
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

It is well known that the use of Chemically Activated Resists (CAR) or Chemically Enhanced Resists (CER) require that the Post Exposure Bake be extremely uniform at temperature ramp and at the steady state as Critical Dimension control is strongly dependent upon bake temperature. A novel, simple and robust method of obtaining near perfect bake temperature uniformity and the enhanced results obtained thereby are discussed.

Citation Download Citation

Gary Hillman and Pierre Infelta "Novel apparatus for the uniform heating of substrates during post expose bake", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485109

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