12 June 2003 Quantum efficiency of PAG decomposition in different polymer matrices at advanced lithographic wavelengths
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Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003); doi: 10.1117/12.483705
Event: Microlithography 2003, 2003, Santa Clara, California, United States
Abstract
The Dill ABC parameters for optical resists are typically determined by measuring the change in the intensity of transmitted light at the wavelength of interest as a function of incident energy. The effectiveness of the experiment rests with the fact that the resist optical properties change with exposure and that the optical properties are directly related to the concentration of PAG compound. These conditions are not typically satisfied in CA resists and thus C is unobtainable by this method. FT-IR spectroscopy can directly measure changes in the photoactive species by isolating and measuring absorbance peaks unique to the photoactive species. We employed the ProABC software, specially modified to allow FT-IR absorbance input, to extract ABS parameters through a best fit of the lithography model to experimental data. The quantum efficiency of PAG decomposition at 157-, 193-, and 248-nm was determined for four diazomethane type PAGs in four different polymer matrices. It was found that both the Dill C parameter and the quantum efficiency for all PAGs increased as wavelength decreased, but that the magnitude of the increase was strongly dependent on the polymer matrix.
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Theodore H. Fedynyshyn, Roger F. Sinta, William A. Mowers, Alberto Cabral, "Quantum efficiency of PAG decomposition in different polymer matrices at advanced lithographic wavelengths", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); doi: 10.1117/12.483705; https://doi.org/10.1117/12.483705
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KEYWORDS
Polymers

Absorbance

Quantum efficiency

FT-IR spectroscopy

Lithography

Polymer thin films

Data modeling

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