Compaction and rarefaction of fused silica with 193-nm excimer laser exposure

J. Martin Algots; Richard Sandstrom; William N. Partlo; Petar Maroevic; Eric Eva; Michael Gerhard; Ralf Linder; Frank Stietz

doi:10.1117/12.485530

26 June 2003 Compaction and rarefaction of fused silica with 193-nm excimer laser exposure

J. Martin Algots, Richard Sandstrom, William N. Partlo, Petar Maroevic, Eric Eva, Michael Gerhard, Ralf Linder, Frank Stietz

Author Affiliations +

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485530
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Extensive testing of the laser damage behavior of fused silica has been performed over the past few years by several researchers. The results have shown that compaction and rarefaction / expansion of the material can occur. The actually observed process depends on the used energy density and laser pulse number at constant pulse length. In order to check the influence of the different laser parameters in more detail, an experimental set up has been constructed that allows us to investigate not only the influence of the energy density and laser pulse number but also the effect of the integrated square pulse width on the laser damage behavior. An optical delay line is used to create a longer integrated pulse width than the natural laser pulse width. To make these tests relevant to the microlithography community, the integrated energy densities chosen for these tests span the range typically found in the projection optics of a 193-nm excimer laser-based microlithography tool. The samples are exposed to several billions of pulses with wavefront measurements made periodically.

Citation Download Citation

J. Martin Algots, Richard Sandstrom, William N. Partlo, Petar Maroevic, Eric Eva, Michael Gerhard, Ralf Linder, and Frank Stietz "Compaction and rarefaction of fused silica with 193-nm excimer laser exposure", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485530

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