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26 June 2003 Comparison of vector theories for aerial image calculation
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Abstract
In simulation of optical lithography it is well known that for high-NA the coupling between the vector components of the electromagnetic wave cannot be ignored and a vector diffraction theory should be employed to calculate aerial images. Commercial programs produce the same aerial image for scalar diffraction theory. When vector models are selected, they give the consistent images in latest versions. However formula of vector models give the different mathematical formula. To understand the origin of the difference, we compared the vector models adopted by Refs.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Byoung Sup Ahn, Sonny Y. Zinn, Sung-Woon Choi, and Jung-Min Sohn "Comparison of vector theories for aerial image calculation", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485354
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