Critical enabling properties of CaF2 lens blanks for state-of-the-art lithography tools

Joerg Hahn; Guenter Grabosch; Lutz Parthier; Konrad Knapp

doi:10.1117/12.485417

26 June 2003 Critical enabling properties of CaF₂ lens blanks for state-of-the-art lithography tools

Joerg Hahn, Guenter Grabosch, Lutz Parthier, Konrad Knapp

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485417
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

F₂ lens designs considering Intrinsic birefringence imposed more severe challenges to CaF₂ manufacturing technology. In order to compensate the intrinsic birefringence other crystal orientations (100) / (110) are necessary. These other crystal orientation beside (111) require individual process optimization. In this paper the achieved improvements for CaF2 lens blank material will be presented. Furthermore the conversion of stress birefringence results from 633nm to 193nm or 157nm is unclear until now. At wavelength birefringence measurement results of different orientated lens blanks will be shown and discussed.

Citation Download Citation

Joerg Hahn, Guenter Grabosch, Lutz Parthier, and Konrad Knapp "Critical enabling properties of CaF₂ lens blanks for state-of-the-art lithography tools", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485417

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