26 June 2003 Detection of actual focus variations by focus automatic measurement
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Abstract
We developed a new focus monitoring method that is simple yet highly accurate. We used simple measurement tools: a conventional binary mask and an optical overlay inspection machine. Our method was sufficiently precise to detect sub-100nm focus errors, and we demonstrated that it had high focus sensitivity under various illuminations (NA, σ, and illumination aperture). We measured actual focus errors by KrF scanner processing and determined the extent of each, i.e., field curvature/astigmatism, wafer topography, and best focus stability.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daigo Hoshino, Daigo Hoshino, Takashi Yamauchi, Takashi Yamauchi, Akira Watanabe, Akira Watanabe, Toshio Onodera, Toshio Onodera, Hidehiro Higashino, Hidehiro Higashino, } "Detection of actual focus variations by focus automatic measurement", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485353; https://doi.org/10.1117/12.485353
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