26 June 2003 Excimer lasers for superhigh NA 193-nm lithography
Author Affiliations +
Abstract
Excimer lasers are widely used as the light source for microlithography scanners. The volume shipment of scanner systems using 193nm is projected to begin in year 2003. Such tools will directly start with super high numerical aperture (NA) in order to take full advantage of the 193nm wavelength over the advanced 248nm systems. Reliable high repetition rate laser light sources enabling high illumination power and wafer throughput are one of the fundamental prerequisites. In addition these light sources must support a very high NA imaging lens of more than 0.8 which determines the output spectrum of the laser to be less than 0.30 pm FWHM. In this paper we report on our recent progress in the development of high repetition rate ultra-narrow band lasers for high NA 193nm microlithography scanners. The laser, NovaLine A4003, is based on a Single Oscillator Ultral Line-narrowed (SOUL) design which yields a bandwidth of less than 0.30pm FWHM. The SOUL laser enables superior optical performance without adding complexity or cost up to the 4 kHz maximum repetition rate. The A4003's high precision line-narrowing optics used in combination with the high repetition rate of 4 kHz yields an output power of 20 W at an extremely narrow spectral bandwidth of less than 0.30 pm FWHM and highest spectral purity of less than 0.75 pm for the 95% energy content. We present performance and reliability data and discuss the key laser parameters. Improvements in the laser-internal metrology and faster regulation control result in better energy stability and improved overall operation behavior. The design considerations for line narrowing and stable laser operation at high repetition rates are discussed.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rainer Paetzel, Rainer Paetzel, Hans Stephan Albrecht, Hans Stephan Albrecht, Peter Lokai, Peter Lokai, Wolfgang Zschocke, Wolfgang Zschocke, Thomas Schmidt, Thomas Schmidt, Igor Bragin, Igor Bragin, Thomas Schroeder, Thomas Schroeder, Christian Reusch, Christian Reusch, Stefan Spratte, Stefan Spratte, } "Excimer lasers for superhigh NA 193-nm lithography", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.485344; https://doi.org/10.1117/12.485344
PROCEEDINGS
7 PAGES


SHARE
RELATED CONTENT

1 kHz 5 W ArF excimer laser for microlithography with...
Proceedings of SPIE (April 06 1999)
The Design Of Excimer Lasers For Use In Microlithography
Proceedings of SPIE (December 31 1987)
Five Watt Industrial Lithography Excimer Laser System
Proceedings of SPIE (October 10 1989)
Narrow Band KrF Excimer Laser Tunable And...
Proceedings of SPIE (December 15 1988)
High-power excimer lasers for 157-nm lithography
Proceedings of SPIE (June 25 2003)

Back to Top