26 June 2003 Guideline of reticle data management
Author Affiliations +
Abstract
We reported the Guideline(Ver.1) of Reticle Data Management (RDM) Activity in 2001. Among we have been focused SoC(System on Chip) Business, we have been improved the efficiency over Design technology, Mask manufacturing and Wafer manufacturing. Especially, These subjects have been the lithography Cost including Reticle Cost, shorter life cycle of product, more difficult technique, lower cost and shorter total TAT from design to chip shipping. Guideline Ver1.0 announced the standardization of interface contents over Design to Mask manufacture, and to wafer manufacture. Guideline Ver2.0 will announce this RDM activity has been developed the optimization of a new engineering chain management in addition to the pattern data and the linkage to EDA in 2003.
© (2003) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Norihiko Miyazaki, N. Iriki, M. Homma, T. Sato, M. Mori, Tadashi Imoriya, Toshio Onodera, T. Matsuda, Hidehiro Higashino, K. Okuda, Iwao Higashikawa, Nobuyuki Yoshioka, "Guideline of reticle data management", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); doi: 10.1117/12.484438; https://doi.org/10.1117/12.484438
PROCEEDINGS
12 PAGES


SHARE
RELATED CONTENT

Anatomy of a universal data model
Proceedings of SPIE (December 27 2002)
The guideline of reticle data management (Ver. 2)
Proceedings of SPIE (June 02 2004)
The guideline of reticle data management
Proceedings of SPIE (August 20 2004)
Methods for comparative extraction of OPC response
Proceedings of SPIE (March 26 2007)

Back to Top